Focused ion beam direct deposition

and its applications

3. Properties of direct deposited films

Measurement of purity by SIMS

(54 eV Au+ on Si) impurity < 100 ppm

Resistivity of direct deposited Au, Cu and Al films

Photograph of fabricated sample

Measured resistivity of direct deposited Au, Cu and Al as a function of energy

Critical temperature of direct deposited Nb film

Measured critical temperature of direct deposited Nb

P : Expected impurity concentration (assuming SH20=1.0)

Solid line : Published relation between critical temperature and oxygen concentration

SH2O=0.2

Structure of direct deposited Au film

TEM image of direct deposited Au film (54 eV Au+ on Si)