Focused ion beam direct deposition

and its applications

2.Low energy FIB apparatus

for direct deposition

Demanded capabilities:

Low energy (<100 eV) and

Small beam diameter (<1µm)

Large beam current density

Alloy ion source and mass filter

Patterning by deflector and sample stage

Sample observation by optical microscope

Low residual gas pressure

Quick sample exchange

Diagram of FIB apparatus for direct deposition

Picture of FIB apparatus for direct deposition

AFM image of a direct deposited Au lines

( 32 eV Au+ on Si substrate)

A cross section profile

Calculated beam diameter and

measured 50 eV Au+ beam diameter

Recalculated beam diameter for Au+ beam

How to get finer beam or

higher beam current density :

Improvements of ion source

Reduced source size

Reduced energy dispersion

Increased angular current density

Improvements of optics

Reduced Magnification

Reduced chromatic aberration

Example of improvement

(calculated for 50 eV Au+ beam, L=deceleration length)

Development of Ion Source

Impregnated-electrode-type LMIS

For conductive material (Au,Cu,Al)

Au-Si alloy LMIS

Au-Cu alloy LMIS

Au-Cu-Si alloy LMIS

Au-Cu-Ge alloy LMIS

Al-Au-Ge alloy LMIS

Au-Cu-Al alloy LMIS

Au-Cu-Al-Ge alloy LMIS

For superconductive material (Nb)

Nb-Au-Cu alloy LMIS

For magnetic material (Co)

Cu-Co-Nb-Au alloy LMIS