Focused ion beam direct deposition

and its applications

1.Principle of FIB direct deposition

What is FIBDD?

Focused Ion Beam Direct Deposition(FIBDD)

= Focused Ion Beam (FIB)+ Ion Beam Deposition (IBD)

What can be expected?

1. Maskless, damage-free, clean process

2. High purity of deposited film

Compare to FIB Induced Deposition

　　　　　　　　FIBID　　　　　　　　　　　　　　　 FIBDD

Low purity(High Resistivity) ⇔ High purity(Low Resistivity)

Pollution by Gas 　　　　　　　⇔ No Pollution

Damage 　　　　　　　　　　　　　⇔ Damage Free

Easy Positioning 　　　　　　　　⇔ Complicated Positioning

Expected purity of deposited film

Expected impurity concentration : P

Y : deposition rate of residual gas / metal film

J : flux density of residual gas / metal ion

S : sticking probability of residual gas / metal ion

P=Yres.gas / (Yres.gas + Ymetal)

　=Jres.gas X Sres.gas / (Jres.gas X Sres.gas + Jmetal X Smetal)