Gas for layer deprocessing
    Updated 10/22/2002

Material	Etching gas
Si	CF4, C2F6, C3F8, CF4 + O2, CCl2F2, CCL4, PCl3, CBrF3
poly Si	CF4, CF4 + O2, CF4 + N2
Si3N4	CF4, CF4 + O2
Mo	CF4, CF4 + O2
Cr2O3	Cl2 + Ar, CCl4 + Ar
Al	CCl4, CCl4 + Ar, BCl3
GaAs	CCl2F3, CHClF2